Title: (TOF-)SIMS profiling of HfO2/Si stacks: Is there a way to minimize the artefacts
Authors: Conard, Thierry ×
Huyghebaert, Cedric
Vandervorst, Wilfried #
Issue Date: 2003
Publisher: AVS Science and Technology
Host Document: pages:124
Conference: International Conference on Secondary Ion Mass Spectrometry - SIMS XIV location:Leuven Belgium date:14/09/03
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Nuclear and Radiation Physics Section
Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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