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Title: Effect of amorphization on activation and deactivation of boron in source/drain, channel and poly gate
Authors: Pawlak, Bartek ×
Duffy, Ray
Janssens, Tom
Vandervorst, Wilfried
Severi, Simone
Richard, Olivier
Benedetti, Alessandro
Eyben, Pierre
Colombeau, B
Cowern, N.E.B
Camillo-Castillo, R.A
Jones, K.S
Aboy, M #
Issue Date: 2005
Publisher: ECS
Host Document: pages:43-49
Conference: Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-based CMOS: New Materials, Processes, and Equipment location:Leuven Belgium date:15/05/05
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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