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|ITEM METADATA RECORD
|Title: ||Effect of amorphization on activation and deactivation of boron in source/drain, channel and poly gate|
|Authors: ||Pawlak, Bartek ×|
Aboy, M #
|Issue Date: ||2005 |
|Host Document: ||pages:43-49|
|Conference: ||Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-based CMOS: New Materials, Processes, and Equipment location:Leuven Belgium date:15/05/05|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Electrical Engineering - miscellaneous|
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author|
# (joint) last author|
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