Title: Characterization and otimalization of 65nm CMOS technology using scanning spreading resistance microscopy
Authors: Eyben, Pierre ×
De Keersgieter, An
Chramtsov, I
Fouchier, M
Janssens, Tom
Vandervorst, Wilfried #
Issue Date: 2005
Host Document: pages:55
Conference: Proceedings of the 8th Int. Workshop on the Fabrication , Characterization and Modeling of Ultra Shallow Junctions in Semicond. location:Leuven Belgium date:05/06/05
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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