|ITEM METADATA RECORD
|Title: ||Characterization and otimalization of 65nm CMOS technology using scanning spreading resistance microscopy|
|Authors: ||Eyben, Pierre ×|
De Keersgieter, An
Vandervorst, Wilfried #
|Issue Date: ||2005 |
|Host Document: ||pages:55|
|Conference: ||Proceedings of the 8th Int. Workshop on the Fabrication , Characterization and Modeling of Ultra Shallow Junctions in Semicond. location:Leuven Belgium date:05/06/05|
|Publication status: ||published|
|KU Leuven publication type: ||IMa|
|Appears in Collections:||Electrical Engineering - miscellaneous|
× corresponding author|
# (joint) last author|
|Files in This Item:
There are no files associated with this item.
All items in Lirias are protected by copyright, with all rights reserved.