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Title: NBTI study on PMOS devices with TiN/HfO2 gate stack and process induced strain
Authors: Shickova, Adelina ×
Verheyen, Peter
Eneman, Geert
San Andres Serrano, Enrique
Absil, Philippe
Kaczer, Ben
Groeseneken, Guido #
Issue Date: 2006
Publisher: ECS transactions Vol 3
Conference: Conference Proceedings Vol 3 , Issue 2, 210th Meeting of The Electrochemical Society location:Leuven Belgium date:29/10/06
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
ESAT - MICAS, Microelectronics and Sensors
× corresponding author
# (joint) last author

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