|ITEM METADATA RECORD
|Title: ||The optimization of the cleaning process to remove residual bonds of SiC and Si-F after fluorocarbon plasma etch on the silicon surface|
|Authors: ||Kim, Young-Chang ×|
Vandervorst, Wilfried #
|Issue Date: ||1999 |
|Host Document: ||pages:291-294|
|Conference: ||Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Electrical Engineering - miscellaneous|
× corresponding author|
# (joint) last author|
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