Title: The optimization of the cleaning process to remove residual bonds of SiC and Si-F after fluorocarbon plasma etch on the silicon surface
Authors: Kim, Young-Chang ×
Baklanov, Mikhaïl
Conard, Thierry
Vanhaelemeersch, Serge
Vandervorst, Wilfried #
Issue Date: 1999
Host Document: pages:291-294
Conference: Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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