|ITEM METADATA RECORD
|Title: ||Characterization of HF-last cleaning of ion-implanted Si surfaces|
|Authors: ||Kondoh, Eiichi ×|
Maex, Karen #
|Issue Date: ||1999 |
|Host Document: ||pages:271-274|
|Conference: ||Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon location:Leuven Belgium|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Associated Section of ESAT - INSYS, Integrated Systems|
× corresponding author|
# (joint) last author|
|Files in This Item:
There are no files associated with this item.
Request a copy
All items in Lirias are protected by copyright, with all rights reserved.