Title: 0.13µm CMOS technology with optimized poly-Si / NO-oxide gate stack
Authors: Kubicek, Stefan ×
Jansen, Philippe
Badenes, Gonçal
Schaekers, Marc
Kol'dyaev, Victor
Deferm, Ludo
De Meyer, Kristin
Kerr, Daniel
Naem, Abdalla #
Issue Date: 1999
Conference: ULSI Process Integration. Proceedings of the First International Symposium; Symposium held in Honolulu, Hawaii at the 196th Meet location:Leuven Belgium
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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