ITEM METADATA RECORD
Title: Comparison of SiO2 and HfO2/SiO2 gate stacks electrical behaviour at a nanometre scale
Authors: Blasco, Xavier ×
Nafria, M
Aymerich, X
Vandervorst, Wilfried #
Issue Date: Jun-2005
Series Title: Electronics Letters vol:41 issue:12 pages:719-721
ISSN: 0013-5194
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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