|ITEM METADATA RECORD
|Title: ||Damage accumulation and dopant migration during shallow As and Sb implantation into Si|
|Authors: ||Werner, M|
van den Berg, J.A
|Issue Date: ||2003 |
|Conference: ||E-MRS Spring Meeting Symposium E: Ion Beams for Nanoscale Surface Modifications location:Salford UK date:10/06/03|
|Publication status: ||published|
|KU Leuven publication type: ||DI|
|Appears in Collections:||Electrical Engineering - miscellaneous|
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