Title: Damage accumulation and dopant migration during shallow As and Sb implantation into Si
Authors: Werner, M
van den Berg, J.A
Armour, D.G
Vandervorst, Wilfried
Collart, E.H.J
Goldberg, R.D
Bailey, P
Noakes, T.C.Q
Issue Date: 2003
Conference: E-MRS Spring Meeting Symposium E: Ion Beams for Nanoscale Surface Modifications location:Salford UK date:10/06/03
Publication status: published
KU Leuven publication type: DI
Appears in Collections:Electrical Engineering - miscellaneous

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