|ITEM METADATA RECORD
|Title: ||Copper-SiLK* semiconductor dielectric interface: XPS surface analysis and RF plasma treatment of the resin|
|Authors: ||Lemaire, J. J|
Pireaux, J. J
Waeterloos, Joost #
|Issue Date: ||1999 |
|Conference: ||Electrochemical Society Fall Meeting: Interconnects and Contact Metallization for ULSI location:Honolulu, HA, USA date:October 1999|
|Publication status: ||published|
|KU Leuven publication type: ||IMa|
|Appears in Collections:||Associated Section of ESAT - INSYS, Integrated Systems|
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