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Title: Characterisation of plasma etch releted residues formed on top of ECD Cu films
Authors: Baklanov, Mikhaïl ×
Conard, Thierry
Lanckmans, Filip
Vanhaelemeersch, Serge
Holmes, D
Maex, Karen #
Issue Date: 2000
Host Document: pages:615-619
Conference: Advanced Metallization Conference 1999 (AMC 1999);
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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