This item still needs to be validated !
Title: Characterisation of plasma etch releted residues formed on top of ECD Cu films
Authors: Baklanov, Mikhaïl ×
Conard, Thierry
Lanckmans, Filip
Vanhaelemeersch, Serge
Holmes, D
Maex, Karen #
Issue Date: 2000
Host Document: pages:615-619
Conference: Advanced Metallization Conference 1999 (AMC 1999);
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.