Wafer-scale growth of graphene on Ge and Si wafers by reduced-pressure chemical vapor deposition

Porret, Clément; Luraschi, Claudio; Nuytten, Thomas; Vanhaeren, Danielle; Conard, Thierry; Verguts, Ken; Brems, Steven; Caymax, Matty; Langer, Robert; Loo, Roger

JSPS - FZ-Jülich Workshop on “Atomically Controlled Processing for Ultra-large Scale Integration”, Date: 2016/01/01 - 2016/01/11, Location: Jülich Germany

Publication date: 2016-01-01

Wafer-scale growth of graphene on Ge and Si wafers by reduced-pressure chemical vapor deposition

Author:

Porret, Clément

Luraschi, Claudio ; Nuytten, Thomas ; Vanhaeren, Danielle ; Conard, Thierry ; Verguts, Ken ; Brems, Steven ; Caymax, Matty ; Langer, Robert ; Loo, Roger