SPIE Advanced Lithography, Date: 2016/02/21 - 2016/02/25, Location: San Jose, California, United States
Publication date:
2016-02-24
Publisher:
SPIE Digital Library
Proc. SPIE 9777, Alternative Lithographic Technologies VIII
Author:
Gronheid, Roel
Singh, Arjun ; Doise, Jan ; Boeckx, Carolien ; Karageorgos, Ioannis ; Ryckaert, Julien ; Pathangi, Hari ; Rincon Delgadillo, Paulina ; Chan, Boon Teik ; Vandenberghe, Geert
Keywords:
Directed self-assembly, grapho-epitaxy, chemo-epitaxy, implementation
Abstract:
In this paper the opportunities and challenges for integrating DSA for IC manufacturing will be discussed. Aspects for application to logic as well as memory technologies will be discussed. The paper will consider various process flows for integration. All aspects of the integration process for these process flows will be discussed, including process defectivity, design compatibility, manufacturability and cost of ownership.