Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms vol:106 issue:1-4 pages:404-408
Buried CoxFe1-x and NixFe1-x silicides were prepared by consecutive metal implantation in Si(111). Transmission-electron microscopy analysis shows strong evidence for the formation of metastable ternary Co0.5Fe0.5Si2 and Ni0.5Fe0.5Si2 precipitates during implantation, the lattice structure of which is believed to be mainly B-type oriented (twinned) CaF2. Annealing of the samples at 1000 degrees C results in coalescence of the silicide into continuous layers with sharp interfaces. During this high-temperature treatment, nearly full phase separation occurs in the case of Co0.5Fe0.5Si2, whereas for Ni0.5Fe0.5Si2 only the onset of phase separation is observed. Channeling spectrometry indicates a good alignment of the silicides with the substrate. Furthermore, all samples were studied with X-ray diffraction and Mossbauer spectrometry, in order to obtain detailed information on the strain and the phases present.