Title: A novel low temperature etch approach to reduce ULK plasma damage
Authors: Zhang, Liping
de Marneffe, Jean-Francois
Leroy, F
Ljazouli, R
Lefaucheux, P
Tillocher, T
Dussart, R
Maekawa, K
Yatsuda, K
Dussarrat, C
De Gendt, Stefan
Baklanov, Mikhaïl
Issue Date: 2015
Conference: Plasma Etch and Strip in Microtechnology - PESM location:Leuven Belgium date:2015-04-27
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Molecular Design and Synthesis

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