Title: Channeled ion beam synthesis of erbium silicide: Comparison of experimental studies and binary collision simulations
Authors: Wahl, Ulrich ×
Vantomme, André
Wu, MF
Pattyn, Hugo
Langouche, Guido #
Issue Date: May-1997
Publisher: Elsevier science bv
Series Title: Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms vol:127-128 pages:311-315
Abstract: It was recently shown that thin films of high-quality rare-earth (RE) silicides can be formed by high-dose implantation of RE-metals into Si under channeling conditions, whereas it is impossible to form continuous RESi layers when using conventional non-channeled (7 degrees tilted) implantation. This different behavior can be explained to a large extent by the differences in projected range, damage density and sputtering yield between channeled and non-channeled implantation, as is shown by comparison of experimental results to model calculations of the initial implantation process using the binary collision code MARLOWE.
ISSN: 0168-583X
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Nuclear and Radiation Physics Section
× corresponding author
# (joint) last author

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