Title: Implantation angle dependence of ion irradiation damage in GaN
Authors: Nord, J ×
Nordlund, K
Pipeleers, Bert
Vantomme, André #
Issue Date: Dec-2003
Publisher: Elsevier science sa
Series Title: Materials science and engineering b-solid state materials for advanced technology vol:105 issue:1-3 pages:111-113
Abstract: We use molecular dynamics (MD) simulations to study the effect of the implantation angle on the damage produced during ion beam irradiation of GaN. We bombard 5 keV Er ions at perfect wurtzite GaN with incident angles of 0degrees-22degrees angle against the [0 0 0 1] crystal axis. The simulations reproduce the angular dependence of the damage observed in the experiments. Two main reasons for the experimentally observed suppression in damage production are found. One is the decreased total damage production for small angles and another is the smaller fraction of clustered defects formed during channeling implantations. Large damage clusters are found to form near the surface. The surface damage peak is stronger for large angle bombardment. (C) 2003 Elsevier B.V. All rights reserved.
ISSN: 0921-5107
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Nuclear and Radiation Physics Section
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science