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Title: The influence of oxygen on the lattice sites of rare earths in silicon
Authors: Wahl, Ulrich ×
Vantomme, André
Langouche, Guido
Correia, JG #
Issue Date: 1999
Publisher: Elsevier science bv
Series Title: Journal of luminescence vol:80 issue:1-4 pages:303-307
Abstract: We have used conversion electron emission channeling to investigate the lattice sites of Er-167m following implantation of the radioactive isotope Tm-167 into CZ Si and FZ Si at varying doses (6 x 10(12) - 5 x 10(13) cm(-2)). In all cases isothermal annealing at 900 degrees C caused Er to leave its preferred near-tetrahedral sites in favour of random lattice sites, but this process occurred by orders of magnitude faster in CZ Si. Furthermore, in CZ Si the incorporation of Er on random lattice sites was fastest in samples implanted with low doses of Tm + Er. We compare our experimental results to a simple numerical model which accounts for the diffusion of Er and O and the formation of ErnOm complexes. On the basis of this model, our experimental data indicate that only a few (probably between 1 and 2)O atoms are required in order to remove an Er atom from its tetrahedral site. (C) 1999 Elsevier Science B.V. All rights reserved.
URI: 
ISSN: 0022-2313
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Nuclear and Radiation Physics Section
× corresponding author
# (joint) last author

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