ITEM METADATA RECORD
Title: Lattice location of implanted Ag in Si
Authors: Wahl, Ulrich ×
Correia, JG
Vantomme, André
ISOLDE Collaboration #
Issue Date: May-2002
Publisher: Elsevier science bv
Series Title: Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms vol:190 pages:543-546
Abstract: The lattice location of implanted silver in Si was studied by means of the emission channeling technique. Following 60 keV room temperature implantation of radioactive Ag-111 at a dose of 2-3 x 10(12) cm(-2), we identify around 30% of Ag on near-substitutional sites (approximate to0.45 Angstrom from ideal S-sites). Upon annealing at 200-300 degreesC, the fraction on near-S sites reaches a maximum around 60-80%. For higher annealing temperatures it decreases again and at 600 degreesC Ag starts to diffuse out of the Si samples. We estimate the activation energy for the dissociation of near-substitutional Ag to be 1.82.2 eV. The experimental results are compared to those of Cu in Si, and common features and characteristic differences in the behavior of the two group 1 B metals are discussed. (C) 2002 Published by Elsevier Science B.V.
URI: 
ISSN: 0168-583X
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Nuclear and Radiation Physics Section
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy

 




All items in Lirias are protected by copyright, with all rights reserved.

© Web of science