Epitaxial nanoscale  films of NixAl100-x (x = 52.5) have been prepared by physical vapour deposition on to a thin him of Ag  on NaCl (001) faces with occasional hillocks. The Ag film contains numerous dislocations and stacking faults and has a rms surface roughness of 2 nm. The Ni-Al film is ordered in the B2 structure and reveals many dislocations as well as antiphase boundaries between ordered domains. The formation of subgrains in the Ni-Al film results in severe height variations up to 30 nm across the surface. A cross-sectional model for the growth of both films is presented.