Title: Influence of oxygen and carbon on the generation and annihilation of radiation defects in silicon
Authors: Trauwaert, MA ×
Vanhellemont, J
Maes, HE
VanBavel, AM
Langouche, Guido
Stesmans, Andre
Clauws, P #
Issue Date: Jan-1996
Publisher: Elsevier science sa lausanne
Series Title: Materials science and engineering b-solid state materials for advanced technology vol:36 issue:1-3 pages:196-199
Abstract: The influence of oxygen and carbon on the generation and annihilation of radiation defects in silicon is studied by deep level transient spectroscopy (DLTS), correlated with photoluminescence (PL) analyses. N(+)p silicon diodes with interstitial oxygen content between 10(16) cm(-3) and 10(18) cm(-3) and carbon content below 10(16) cm(-3), are irradiated by 2 MeV electrons with fluences ranging from 5 x 10(14) cm(-2) to 10(16) cm(-2). The DLTS spectra reveal two hole traps characterised by an activation energy of respectively 0.19 eV and 0.36 eV. Correlation with PL measurements confirmed the association of the 0.36 eV level with a CiOi and/or CiCs complex. Isothermal anneals performed at 200 degrees C resulted in a gradual conversion of the E(v) +0.19 eV to a defect level at E(v) +0.24 eV. From the oxygen content dependence of the transformation it is suggested that the divacancy diffuses and is trapped by interstitial oxygen forming a V2O complex.
ISSN: 0921-5107
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Nuclear and Radiation Physics Section
Semiconductor Physics Section
× corresponding author
# (joint) last author

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