Title: Ultralow-k dielectrics made by supercritical foaming of thin polymer films
Authors: Krause, B ×
Koops, GH
van der Vegt, NFA
Wessling, M
W├╝bbenhorst, Michael
van Turnhout, J #
Issue Date: Aug-2002
Publisher: VCH Publishers
Series Title: Advanced materials vol:14 issue:15 pages:1041-+
Abstract: Ultralow dielectric constants have been achieved for thin porous films of high-T-g polymers. Rapid solid-state polymer expansion applying supercritical carbon dioxide was used to create nanosized cavities in thin films of aromatic polyimides (see Figure). Foamed films with spherical voids less than 10 nm in size as well as multilayered microstructures with interlayer distances of less than 20 nm were made with k values as low as 1.77.
ISSN: 0935-9648
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Soft Matter and Biophysics
× corresponding author
# (joint) last author

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