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Title: Structural-properties of thin silicide layers formed by high-dose metal implantation
Authors: Vantomme, André ×
Wu, Mf
Langouche, Guido
Vanderstraeten, Hélène
Bruynseraede, Yvan #
Issue Date: Nov-1991
Publisher: Elsevier science bv
Series Title: Applied surface science vol:53 pages:278-282
Abstract: The strain and orientation of buried and surface CoSi2 layers have been studied in a thickness range from 160 to 600 angstrom. Using different implantation energies and doses, a unique combination of CoSi2 epitaxial layers was obtained having the same strain but a variable orientation. These novel structures are interesting for epitaxial growth studies and may have important device applications.
ISSN: 0169-4332
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Nuclear and Radiation Physics Section
Solid State Physics and Magnetism Section
× corresponding author
# (joint) last author

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