Title: Lattice location of implanted Cu in Si
Authors: Wahl, Ulrich ×
Correia, JG
Vantomme, André
Langouche, Guido
ISOLDE Collaboration #
Issue Date: Dec-1999
Publisher: Elsevier science bv
Series Title: Physica b-condensed matter vol:273-274 pages:367-370
Abstract: We have implanted the radioactive probe atom Cu-67 (t(1/2) = 61.9 h) into single-crystalline Si. Monitoring the beta(-) emission yield from the decay of Cu-67 to Zn-67 as a function of angle from different crystallographic directions allows to determine the lattice location of the Cu atoms by means of the emission channeling effect. We give direct evidence that the majority of implanted Cu occupies near-substitutional sites. As most-likely lattice location we suggest a displacement of 0.51(7) Angstrom along [1 1 1] directions from substitutional sites to bond center positions. The annealing behavior shows that near-substitutional Cu is remarkably stable, and we estimate a dissociation energy of 2.2(3) eV. (C) 1999 Elsevier Science B.V. All rights reserved.
ISSN: 0921-4526
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Nuclear and Radiation Physics Section
× corresponding author
# (joint) last author

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