Title: Degradation and breakdown of plasma oxidized magnetic tunnel junctions: Single trap creation in Al2O3 tunnel barriers
Authors: Das, J
Degraeve, R
Kaczer, B
Boeve, H
Vanhelmont, F
Groeseneken, Guido
Borghs, Gustaaf
De Boeck, J #
Issue Date: Sep-2003
Publisher: Ieee-inst electrical electronics engineers inc
Series Title: IEEE Transactions on Magnetics vol:39 issue:5 pages:2815-2817
Abstract: We present an in-depth analysis of the reliability of plasma oxidized magnetic tunnel junctions, using constant voltage stress until breakdown. In the stress measurements, prebreakdown current jumps were also observed. We show that the prebreakdown jumps, as well as the final breakdown are caused by the generation of single trap conduction paths in the barrier. Finally, we demonstrate that applying stress can also cause gradual resistance changes, which can either be reversible or irreversible.
ISSN: 0018-9464
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
Physics and Astronomy - miscellaneous
ESAT - MICAS, Microelectronics and Sensors
# (joint) last author

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