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Title: A microstructural study of the thermal stability of atomic layer deposited Al2O3 thin films
Authors: Nistor, L ×
Richard, O
Zhao, C
Bender, H
Stesmans, Andre
Van Tendeloo, G #
Issue Date: 2003
Publisher: Adam Hilger
Series Title: Institute of Physics Conference Series issue:180 pages:397-400
Abstract: The thermal stability of amorphous Al2O3 films (similar to8 and 80 nut thick) deposited by atomic layer deposition on HF-last and thin SiO2 covered (001) Si substrates is studied by transmission electron microscopy. The layers are in- and ex-situ annealed in the same temperature range.
Description: Microscopy of semiconducting materials 2003
ISSN: 0951-3248
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Semiconductor Physics Section
× corresponding author
# (joint) last author

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