|ITEM METADATA RECORD
|Title: ||Analytical model for anomalous positive bias temperature instability in La-based HfO2 nFETs based on independent characterization of charging components|
|Authors: ||Toledano Luque, Maria|
|Issue Date: ||2013 |
|Series Title: ||Microelectronic Engineering vol:109 pages:314-317|
|Publication status: ||published|
|KU Leuven publication type: ||IT|
|Appears in Collections:||Supporting Services Campusmanagement Science, Engineering and Technology|
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