Title: Cryogenic etching reduces plasma-induced damage of ultralow-k dielectrics
Authors: Baklanov, Mikhaïl
de Marneffe, Jean-Francois
Zhang, Liping
Ciofi, Ivan
Tokei, Zsolt
Issue Date: 2014
Publisher: PennWell Corporation
Series Title: Solid State Technology vol:57 issue:5
ISSN: 0038-111X
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Supporting Services Campusmanagement Science, Engineering and Technology

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