|ITEM METADATA RECORD
|Title: ||Cryogenic etching reduces plasma-induced damage of ultralow-k dielectrics|
|Authors: ||Baklanov, Mikhaïl|
de Marneffe, Jean-Francois
|Issue Date: ||2014 |
|Publisher: ||PennWell Corporation|
|Series Title: ||Solid State Technology vol:57 issue:5|
|Publication status: ||published|
|KU Leuven publication type: ||IT|
|Appears in Collections:||Supporting Services Campusmanagement Science, Engineering and Technology|
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