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Title: Improved channel hot carrier reliability in p-FinFETs with replacement metal gate by a nitrogen post deposition anneal process
Authors: Cho, Moon Ju ×
Arimura, Hiroaki
Lee, Jae Woo
Kaczer, Ben
Veloso, Anabela
Boccardi, Guillaume
Ragnarsson, Lars-Ake
Kauerauf, Thomas
Horiguchi, Naoto
Groeseneken, Guido #
Issue Date: Mar-2014
Publisher: Institute of Electrical and Electronics Engineers
Series Title: IEEE Transactions on Device and Materials Reliability vol:14 issue:1 pages:408-412
ISSN: 1530-4388
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Supporting Services Campusmanagement Science, Engineering and Technology
× corresponding author
# (joint) last author

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