Title: Front end of the line process
Authors: Han, Jeong Hwan
Cho, Moon Ju
Delabie, Annelies
Park, Tae Joo
Hwang, Cheol Seong
Issue Date: 2014
Publisher: Springer
Host Document: Atomic Layer Deposition for Modern Semiconductor Devices pages:175-208
ISBN: 978-1-4614-8053-2
Publication status: published
KU Leuven publication type: IHb
Appears in Collections:Supporting Services Campusmanagement Science, Engineering and Technology

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