|ITEM METADATA RECORD
|Title: ||Plasma cryoetching processes for silicon and advanced materials|
|Authors: ||Dussart, R|
de Marneffe, Jean-Francois
|Issue Date: ||2014 |
|Conference: ||International Conference on Microelectronics and Plasma Technology - ICMAP location:Gunsan Korea date:2014-07-08|
|Publication status: ||published|
|KU Leuven publication type: ||IMa|
|Appears in Collections:||Supporting Services Campusmanagement Science, Engineering and Technology|
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