Title: Plasma cryoetching processes for silicon and advanced materials
Authors: Dussart, R
Tillocher, T
Gosset, N
Vital, A
Lefaucheux, P
L'jazouli, R
Boufnichel, M
Vayer, M
Sinturel, C
Zhang, Liping
de Marneffe, Jean-Francois
Baklanov, Mikhaïl
Nishimura, E
Yatsuda, K
Maekawa, K
Issue Date: 2014
Conference: International Conference on Microelectronics and Plasma Technology - ICMAP location:Gunsan Korea date:2014-07-08
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Molecular Design and Synthesis

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