Title: 15nm-WFIN high-performance low-defectivity strained-germanium pFinFETs with low temperature STI-last process
Authors: Mitard, Jerome
Witters, Liesbeth
Loo, Roger
Lee, Seung Hun
Sun, J.W
Franco, Jacopo
Ragnarsson, Lars-Ake
Brand, A
Lu, X
Yoshido, N
Eneman, Geert
Brunco, David
Vorderwestner, M
Storck, P
Milenin, Alexey
Hikavyy, Andriy
Waldron, Niamh
Favia, Paola
Vanhaeren, Danielle
Vanderheyden, Annelies
Richard, Olivier
Mertens, Hans
Arimura, Hiroaki
Sioncke, Sonja
Vrancken, Christa
Bender, Hugo
Eyben, Pierre
Barla, Kathy
Lee, Sun Ghil
Horiguchi, Naoto
Collaert, Nadine
Thean, Aaron
Issue Date: 2014
Host Document: Symposium on VLSI Technology pages:138-139
Conference: Symposium on VLSI Technology location:Honolulu, HI USA date:2014-06-09
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Supporting Services Campusmanagement Science, Engineering and Technology

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