Title: Impact of the starting surface on the film characteristics of thermal Ru ALD for metal-insulator-metal applications
Authors: Popovici, Mihaela Ioana
Delabie, Annelies
Adelmann, Christoph
Marcoen, Kristof
Groven, Benjamin
Swerts, Johan
Meersschaut, Johan
Franquet, Alexis
Redolfi, Augusto
Jurczak, Malgorzata
Van Elshocht, Sven
Issue Date: 2014
Host Document: AVS Topical Conference on Atomic Layer Deposition - ALD pages:105
Conference: AVS Topical Conference on Atomic Layer Deposition - ALD location:Kyoto Japan date:2014-06-15
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Supporting Services Campusmanagement Science, Engineering and Technology

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.