Title: Material studies on Si:C and Si:CP epitaxial films grown using disilane, monomethylsilane and phosphine
Authors: Dhayalan, Sathish Kumar
Loo, Roger
Rosseel, Erik
Hikavyy, Andriy
Shimura, Yosuke
Nuytten, Thomas
Richard, Olivier
Bender, Hugo
Douhard, Bastien
Vandervorst, Wilfried
Issue Date: 2014
Conference: 226th Fall Meeting of the Electrochemical Society location:Cancun Mexico date:2014-10-05
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Supporting Services Campusmanagement Science, Engineering and Technology

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