Title: Stochastic and systematic patterning failure mechanisms for contact-holes in EUV lithography: part 2
Authors: Vaglio Pret, Alessandro
De Bisschop, Peter
Smith, Mark
Biafore, John
Issue Date: 2014
Host Document: Extreme Ultraviolet (EUV) Lithography V vol:9048
Conference: Extreme Ultraviolet (EUV) Lithography V location:San Jose, CA USA date:2014-02-23
Article number: 904834
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Supporting Services Campusmanagement Science, Engineering and Technology

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