|ITEM METADATA RECORD
|Title: ||Stochastic and systematic patterning failure mechanisms for contact-holes in EUV lithography: part 2|
|Authors: ||Vaglio Pret, Alessandro|
De Bisschop, Peter
|Issue Date: ||2014 |
|Host Document: ||Extreme Ultraviolet (EUV) Lithography V vol:9048|
|Conference: ||Extreme Ultraviolet (EUV) Lithography V location:San Jose, CA USA date:2014-02-23|
|Article number: ||904834|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Supporting Services Campusmanagement Science, Engineering and Technology|
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