|ITEM METADATA RECORD
|Title: ||Replacement metal gate/high-k last technology for aggressively scaled planar and FinFET-based devices|
|Authors: ||Veloso, Anabela|
Lee, Jae Woo
Cho, Moon Ju
|Issue Date: ||2014 |
|Conference: ||International Symposium on Dielectrics for Nanosystems 6: Materials Science, Processing, Reliability, and Manufacturing location:Orlando, FL USA date:2014-05-11|
|Publication status: ||published|
|KU Leuven publication type: ||IMa|
|Appears in Collections:||Supporting Services Campusmanagement Science, Engineering and Technology|
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