Title: Replacement metal gate/high-k last technology for aggressively scaled planar and FinFET-based devices
Authors: Veloso, Anabela
Lee, Jae Woo
Simoen, Eddy
Ragnarsson, Lars-Ake
Arimura, Hiroaki
Cho, Moon Ju
Boccardi, Guillaume
Thean, Aaron
Horiguchi, Naoto
Issue Date: 2014
Conference: International Symposium on Dielectrics for Nanosystems 6: Materials Science, Processing, Reliability, and Manufacturing location:Orlando, FL USA date:2014-05-11
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:ESAT - MICAS, Microelectronics and Sensors

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