Title: Material studies on Si:C and Si:CP epitaxial films grown using disilane, monomethylsilane and phosphine
Contributors: Dhayalan;Sathish; SATHISH, KUMAR/U0074546
Loo;Roger; ROGER,
Rosseel;Erik; ERIK,
Hikavyy;Andriy; ANDRIY,
Shimura;Yosuke; YOSUKE,
Nuytten;Thomas; THOMAS,
Richard;Olivier; OLIVIER,
Bender;Hugo; HUGO,
Douhard;Bastien; BASTIEN,
Vandervorst;Wilfried/U0008850; WILFRIED/U0008850,
Issue Date: 2007
Publication status: published
KU Leuven publication type: DI
Appears in Collections:Nuclear and Radiation Physics Section

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