|ITEM METADATA RECORD
|Title: ||High Ge content SiGe thin films: growth, properties and integration|
|Authors: ||Hikavyy, Andriy|
Dhayalan, Sathish Kumar
|Issue Date: ||2014 |
|Host Document: ||SiGe, Ge, and Related Copounds 6: Materials, Processing, and Devices vol:64 issue:6 pages:831-839|
|Conference: ||SiGe, Ge, and Related Copounds 6: Materials, Processing, and Devices location:Cancun Mexico date:2014-10-05|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Supporting Services Campusmanagement Science, Engineering and Technology|
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