Title: Influence of trench width on III-V nucleation during InP selective area growth on pattern Si(001) substrate
Authors: Jiang, Sijia
Merckling, Clement
Guo, Weiming
Waldron, Niamh
Moussa, Alain
Caymax, Matty
Vandervorst, Wilfried
Seefeldt, Marc
Heyns, Marc
Issue Date: 2014
Conference: ECS and SMEQ Joint International Meeting location:Cancun Mexico date:2014-10-05
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Supporting Services Campusmanagement Science, Engineering and Technology

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