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SPIE Advanced Lithography Advances in Patterning Materials and Processes, Date: 2014/02/24 - 2014/02/27, Location: San Jose: CA

Publication date: 2014-01-01
Volume: 9051
ISSN: 9780819499745
Publisher: Society of Photo-optical Instrumentation Engineers

Proceedings of SPIE

Author:

Gronheid, Roel
Bekaert, Joost ; Kuppuswamy, Vijaya-Kumar Murugesan ; Vandenbroeck, Nadia ; Doise, Jan ; Cao, Yi ; Lin, Guanyang ; Sayan, Safak ; Parnell, Doni ; Somervell, Mark ; Wallow, Thomas I ; Hohle, Christoph K

Keywords:

Directed self-assembly, grapho-epitaxy, templated DSA, cylinders, Science & Technology, Physical Sciences, Optics, 4006 Communications engineering, 4009 Electronics, sensors and digital hardware, 5102 Atomic, molecular and optical physics

Abstract:

Directed Self-Assembly (DSA) of Block Co-Polymers (BCP) has become an intense field of study as a potential patterning solution for future generation devices. The most critical challenges that need to be understood and controlled include pattern placement accuracy, achieving low defectivity in DSA patterns and how to make chip designs DSA-friendly. The DSA program at imec includes efforts on these three major topics. Specifically, in this paper the progress in setting up flows for templated DSA within the imec program will be discussed. A process has been implemented based on a hard mask as the template layer. In this paper primarily the impact of local pattern density and BCP film thickness on the templated DSA process are discussed. The open hole rate and the placement accuracy of BCP patterns within the template are the primary figures of merit.. © 2014 SPIE.