|ITEM METADATA RECORD
|Title: ||Cleaning aspects of novel materials after CMP|
|Authors: ||Vos, R|
Mertens, P. W #
|Issue Date: ||2011 |
|Publisher: ||Electrochemical Society, Inc|
|Host Document: ||Electrochemical Society Transactions - ECS Transactions vol:34 issue:1 pages:671-676|
|Conference: ||10th China Semiconductor Technology International Conference (CSTIC) location:: PEOPLES R CHINA date:2011|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Non-KU Leuven Association publications|
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