Title: Cleaning aspects of novel materials after CMP
Authors: Vos, R
Wada, M
Arnauts, S
Takahashi, H
Cuypers, Daniel
Struyf, H
Mertens, P. W #
Issue Date: 2011
Publisher: Electrochemical Society, Inc
Host Document: Electrochemical Society Transactions - ECS Transactions vol:34 issue:1 pages:671-676
Conference: 10th China Semiconductor Technology International Conference (CSTIC) location:: PEOPLES R CHINA date:2011
ISBN: 978-1-60768-235-6
ISSN: 1938-5862
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Non-KU Leuven Association publications
# (joint) last author

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