| ITEM METADATA RECORD |
| Title: | Lattice location and thermal stability of implanted nickel in silicon studied by on-line emission channeling |
| Authors: | Silva, D. J ×
Wahl, Ulrich
Correia, J. G
Pereira, Lino
Amorim, L. M
da Silva, M. R
Bosne, E
Araujo, J. P # |
| Issue Date: | 8-Jan-2014 |
| Publisher: | American Institute of Physics |
| Series Title: | Journal of Applied Physics vol:115 issue:2 pages:023504-1-023504-9 |
| Article number: | 023504 |
| ISSN: | 0021-8979 |
| Publication status: | published |
| KU Leuven publication type: | IT |
| Appears in Collections: | Nuclear and Radiation Physics Section
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× corresponding author |
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# (joint) last author |
| Files in This Item: |
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| Lattice location and thermal stability of implanted nickel in silicon studied by on-line emission channeling.pdf | |
Published
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6277Kb | Adobe PDF | View/Open |
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