Title: Stress induced defect generation implications of doping HfO2 with Al
Authors: O'Connor, Robert
Kauerauf, Thomas
Arimura, Hiroaki
Ragnarsson, Lars-Ake
Issue Date: 2013
Publisher: North-Holland
Series Title: Microelectronic Engineering vol:109 pages:54-56
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:ESAT - MICAS, Microelectronics and Sensors

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