Title: Low damage cryogenic etching of porous organosilicate low-k materials using SF6/O2/SiF4
Authors: Zhang, Liping
Ljazouli, Rami
Lefaucheux, Philippe
Tillocher, Thomas
Dussart, Remi
Mankelevich, Yuri
de Marneffe, Jean-Francois
De Gendt, Stefan
Baklanov, Mikhaïl
Issue Date: 2013
Publisher: Electrochemical Society, Inc.
Series Title: ECS Journal of Solid State Science and Technology vol:2 issue:6 pages:N131-N139
ISSN: 2162-8769
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Molecular Design and Synthesis

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