Title: NBTI reliability of SiGe and Ge channel pMOSFETs with SiO2/HfO2 dielectric stack
Authors: Franco, Jacopo
Kaczer, Ben
Mitard, Jerome
Toledano Luque, Maria
Roussel, Philippe
Witters, Liesbeth
Grasser, Tibor
Groeseneken, Guido
Issue Date: 2013
Publisher: Institute of Electrical and Electronics Engineers
Series Title: IEEE Transactions on Device and Materials Reliability vol:13 issue:4 pages:497-506
ISSN: 1530-4388
Publication status: published
KU Leuven publication type: IT
Appears in Collections:ESAT - MICAS, Microelectronics and Sensors

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