Title: Damage free cryogenic etching of a porous organosilica ultralow-k film
Authors: Zhang, Liping
Leffaucheux, P
Tillocher, T
Dussart, R
Mankelevich, Y
de Marneffe, Jean-Francois
De Gendt, Stefan
Baklanov, Mikhaïl
Issue Date: 2013
Publisher: The Electrochemical Society
Series Title: Electrochemical and Solid-State Letters vol:2 issue:2 pages:N5-N7
ISSN: 1099-0062
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Molecular Design and Synthesis

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