|ITEM METADATA RECORD
|Title: ||Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma: Modeling and experimental investigation|
|Authors: ||Samara, Vladimir|
Van Laer, Koen
de Marneffe, Jean-Francois
|Issue Date: ||2013 |
|Publisher: ||IOP Pub.|
|Series Title: ||Plasma Sources Science & Technology vol:22 issue:2 pages:25011|
|Publication status: ||published|
|KU Leuven publication type: ||IT|
|Appears in Collections:||Non-KU Leuven Association publications|
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