Title: Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma: Modeling and experimental investigation
Authors: Samara, Vladimir
Van Laer, Koen
Tinck, Stefan
de Marneffe, Jean-Francois
Bogaerts, Annemie
Issue Date: 2013
Publisher: IOP Pub.
Series Title: Plasma Sources Science & Technology vol:22 issue:2 pages:25011
ISSN: 0963-0252
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Non-KU Leuven Association publications

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