ITEM METADATA RECORD
Title: Self-aligned double patterning of 1x nm FinFETs; a new device integration through the challenging geometry
Authors: Kim, Min-Soo
Vandeweyer, Tom
Altamirano Sanchez, Efrain
Dekkers, Harold
Van Besien, Els
Tsvetanova, Diana
Richard, Olivier
Chew, Soon Aik
Boccardi, Guillaume
Horiguchi, Naoto
Issue Date: 2013
Host Document: 14th International Conference on Ultimate Integration in Silicon - ULIS
Conference: 14th International Conference on Ultimate Integration in Silicon - ULIS location:Warwick UK date:19/03/2013
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Non-KU Leuven Association publications

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