Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher

Murugesan Kuppuswamy, Vijaya-Kumar; Constantoudis, Vassilios; Gogolides, Evangelos; Vaglio Pret, Alessandro; Gronheid, Roel

doi:10.1117/1.JMM.12.2.023003

Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher

Author:

Murugesan Kuppuswamy, Vijaya-Kumar

Constantoudis, Vassilios ; Gogolides, Evangelos ; Vaglio Pret, Alessandro ; Gronheid, Roel

Keywords:

Science & Technology, Technology, Physical Sciences, Engineering, Electrical & Electronic, Nanoscience & Nanotechnology, Materials Science, Multidisciplinary, Optics, Engineering, Science & Technology - Other Topics, Materials Science, contact edge roughness, critical dimension uniformity, extreme ultraviolet lithography, resist, sensitizer, photoacid generator, quencher, power spectrum, line edge roughness, SHOT-NOISE, DEPROTECTION, HOLES, NM