Title: Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher
Authors: Murugesan Kuppuswamy, Vijaya-Kumar
Constantoudis, Vassilios
Gogolides, Evangelos
Vaglio Pret, Alessandro
Gronheid, Roel
Issue Date: 2013
Publisher: SPIE-The International Society for Optical Engineering
Series Title: Journal of Microlithography, Microfabrication and Microsystems vol:12 issue:2 pages:23003
ISSN: 1537-1646
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Supporting Services Campusmanagement Science, Engineering and Technology

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