|ITEM METADATA RECORD
|Title: ||Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher|
|Authors: ||Murugesan Kuppuswamy, Vijaya-Kumar|
Vaglio Pret, Alessandro
|Issue Date: ||2013 |
|Publisher: ||SPIE-The International Society for Optical Engineering|
|Series Title: ||Journal of Microlithography, Microfabrication and Microsystems vol:12 issue:2 pages:23003|
|Publication status: ||published|
|KU Leuven publication type: ||IT|
|Appears in Collections:||Supporting Services Campusmanagement Science, Engineering and Technology|
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