Title: Double patterning with dual hard mask for 28nm node devices and below
Authors: Hody, Hubert
Paraschiv, Vasile
Vecchio, Emma
Locorotondo, Sabrina
Winroth, Gustaf
Athimulam, Raja
Boullart, Werner
Issue Date: 2013
Publisher: SPIE-The International Society for Optical Engineering
Series Title: Journal of Microlithography, Microfabrication and Microsystems vol:12 issue:4 pages:41306
ISSN: 1537-1646
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Non-KU Leuven Association publications

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